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The Process of PVD Coating
PVD, or Physical Vapor Deposition, is a process used to deposit thin films of material onto a substrate. PVD coatings are often used to improve the surface properties of a material, such as its wear resistance, corrosion resistance, and appearance. There are several different types of PVD coatings, including sputter deposition, evaporation, and ion plating.
In PVD coating, the substrate is placed in a vacuum chamber, and a target material is vaporized using a variety of methods, such as heating, ionizing, or sputtering. The vaporized material is then deposited onto the substrate as a thin film. PVD coatings can be applied to a wide range of materials, including metals, plastics, and ceramics.
PVD coatings are used in a variety of applications, including in the aerospace, automotive, and medical industries. They are also used in the production of decorative and functional coatings, such as those found on watches and other consumer electronics.
Multi arc ion plating introduces various gas discharge modes into the field of vapor deposition under vacuum situation. The whole vapor deposition process is carried out in plasma process. It can be coated not only on the surface of metal products, but also on the surface of non-metal products. It can be plated with metal film, Titanium nitride, titanium carbide, zirconium nitride, chromium nitride, titanium oxide and other films.
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