What is Physical Vapor Deposition- Ningbo Honyu Vacuum Technology Co., Ltd.

What is Physical Vapor Deposition

Physical vapor deposition technology refers to the use of physical methods under vacuum conditions to vaporize the surface of a material source (solid or liquid) into gaseous atoms or molecules, or partially ionize into ions, and deposit on the surface of the substrate through a low-pressure gas (or plasma) process Physical vapor deposition is one of the main surface treatment technologies for thin films with certain special functions.

PVD (physical vapor deposition) coating technology is mainly divided into three categories: vacuum evaporation coating, vacuum sputtering coating and vacuum ion coating. The main methods of physical vapor deposition are: vacuum evaporation, sputtering coating, arc plasma coating, ion coating and molecular beam epitaxy. The corresponding vacuum coating equipment includes vacuum evaporation coating machine, vacuum sputtering coating machine and vacuum ion coating machine.

With the improvement of deposition methods and technologies, physical vapor deposition technology can not only deposit metal films, alloy films, but also compounds, ceramics, semiconductors, polymer films, etc.

Physical vapor deposition technology has had some applications as early as the early 20th century, but it has rapidly developed into a new technology with broad application prospects in the past 30 years, and is developing towards the trend of environmental protection and cleanliness. It has become more and more widely used in the watch industry, especially the surface treatment of high-end watch metal parts.