MATERIAL |
DEPOSITION TECHNOLOGY |
DENSITY g/cm3 |
Sp3% |
HARDNESS GPa |
FRICTION COEFFICIENT |
DIAMOND |
NATURAL |
3.52 |
100 |
100 |
0.02~0.10 |
a-C |
SPUTTERING |
1.9~2.4 |
25 |
11~24 |
0.10~0.15 |
a-C:H:M |
REACTIVE SPUTTERING |
1.9~2.4 |
10~20 |
0.10~0.20 |
|
a-C:H |
RF SPUTTERING |
1.57~1.70 |
16~40 |
0.02~0.47 |
|
a-C,a-C:H |
ION BEAM |
1.8~3.5 |
32~75 |
0.06~0.19 |
|
ta-C |
MAGNET FILTER |
2.8~3.0 |
85~95 |
40~80 |
0.04~0.14 |
Ta-C |
PLD |
2.4 |
85~95 |
40~80 |
0.03~0.15 |
NAMI DIAMOND |
PLD |
2.9~3.5 |
75 |
80~100 |